Research and Development

Fujimi Corporation’s Research and Development (R&D) team works tirelessly to make advancements in customers’ existing products and leads the way in developing innovative solutions to take customers’ products and applications to the next level.

The R&D team of Ph.D. scientists and technicians take a collaborative approach to research. The team is committed to building long-lasting relationships and a high-level of trust with customers.

As experts in planarization, the R&D team gets to know customers and their associated business challenges, applications and market opportunities. Then the team applies its expertise in planarization to customers’ products and uses leading-edge industry tools to develop tailored slurries that meet each customer’s application and market needs. This close integration enables Fujimi Corporation to create high quality solutions that contribute to customers’ competitive advantage.

Additionally, the R&D team works with Fujimi Corporation manufacturing and engineering units to deliver products efficiently, economically and sustainably—ensuring customers get the best value.



  • Chemical Mechanical Planarization (CMP) expertise
  • Research on leading-edge technologies
  • Focused development on specific customer targets
  • Product testing on customer’s pads and wafers
  • Onsite technical support to help customers ramp up new products
  • Ongoing support to sustain products

R&D is a pillar of Fujimi Corporation’s operations. This special focus on R&D fuels Fujimi Corporation’s success and the success of its customers, which results in: 

  • Improved product quality
  • Finer finishing capabilities
  • New applications and market opportunities
  • Significant technological product advancements
  • Continuous process improvements
  • Cost savings and manufacturing efficiencies
  • More environmentally friendly products and processes
  • Copper
  • Barrier Metals
    • Tantalum
    • Tantalum Nitride
    • Ruthenium
    • Cobalt
  • ILD Polish (Silicon Dioxide)
  • Aluminum
  • Polycrystalline silicon
  • Tungsten
  • Silicon Nitride
  • Front End-of-Line Polish
  • Noble Metals
    • Platinum
    • Palladium
    • Nickel
  • III-V Semiconductor Polish
    • Gallium Arsenide
    • Indium Phosphide
  • GST (Germanium Antimony Tellurium)