GLANZOX - Silicon Polish
GLANZOX is a colloidal silica suspended in liquid plus special ingredients. On semiconductor wafers, GLANZOX produces a near perfectly smooth surface down to the nanometer level. In addition, GLANZOX greatly reduces the metal impurities that can be left by the polishing process.
Typical Physical Properties of GLANZOX
| Product | Physical Properties | |||||
| Main Component | Content of SiO2 | pH | Specific Gravity | Average Particle Size (nm) | Application | |
| HP-20 | Ultra-Pure SiO2 | 17.5 | 11.4 | 1.11 | 35 | First and Second Polishing |
| 1100 | Ultra-Pure SiO2 | 17.5 | 11.5 | 1.10 | 35 | First and Second Polishing |
| 1103 | Ultra-Pure SiO2 | 17.5 | 11.4 | 1.1 | 35 | First Polishing |
| 1202 | - | - | - | - | - | Recycled Wafer Processing |
| 1302 | Pure SiO2 | 18.5 | 11.4 | 1.1 | 35 | First Polishing |
| 1304 | Pure SiO2 | 18.5 | 11.4 | 1.1 | 9 | First Polishing |
| 3100 | Ultra-Pure SiO2 | 9.1 | 10.3 | 1.05 | 35 | Final Polishing |
| 3100M | Ultra-Pure SiO2 | 9.1 | 10.3 | 1.05 | 35 | Final Polishing |
| 3101 | Ultra-Pure SiO2 | 4.5 | 10.6 | 1.03 | 35 | Final Polishing |
| 3105 | - | - | - | - | - | - |
| 3500 | Cleaning Agent | - | 10.1 | 1.0 | - | - |
| 3900 | Ultra-Pure SiO2 | 9.1 | 10.5 | 1.05 | 35 | Final Polishing |
| 3900RS | Ultra-Pure SiO2 | 9.1 | 10.5 | 1.05 | 35 | Final Polishing |
| 3950 | Ultra-Pure SiO2 | 4.5 | 10.8 | 1.03 | 35 | Final Polishing |
Product Stats:
- Category:
- Polishing
- Application:
- Bare Silicon Wafer Polishing, polishing, First polishing, Second Polishing, Final Polishing
- Type:
- Silicon Polish
- Material:
- Silicon, colloidal silica
