Source: Clarkson University Press Release – 9/4/2013 More than 100 researchers from several high- technology companies, including Fujimi staff, suppliers and universities from the United States,
Fujimi Corporation scientist, Hooi-Sung (Brian) Kim made a presentation on the development of high and low selectivity slurry for Silicon Carbonitride at the CAMP 2013
Samsung has announced that it has begun mass producing the industry’s first three-dimensional (3D) Vertical NAND (V-NAND) flash memory, which breaks through the current scaling
by Ebrahim Elfadel via The National Inside even the smallest of gadgets, there are many tiny parts and components that must come together as a
Fujimi Corporation is excited to announce the development of a new series of plastic lens polishing slurries. The DPL 1200 series is comprised of compound
Fujimi Corporation is excited to announce the development of a new series of highly pure silane coated alumina particles for the laminated flooring market. The
Fujimi Corporation, through our participation in the Shred-itTM shredding and recycling program, saved 41.9 trees from destruction in 2012 through our shredding and recycling of approximately
Fujimi Corporation is proud to announce that it was recently awarded for its recycling and waste reduction efforts by Washington County’s Recycle at Work program.
Newly Redesigned Website at http://35.90.24.10 Fujimi Corporation is excited to announce the release of our newly re-designed corporate website. Through collaborative design and development between Fujimi
In August 2012, Fujimi Research & Development personnel presented the company’s current ruthenium barrier slurry development work at the 17th Annual Symposium on Chemical-Mechanical Planarization
