The Latest Fujimi News

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Introducing POLIPLA to the Americas

Posted July 17, 2017

FUJIMI –Introducing POLIPLA to the Americas Press Release Date: July 17, 2017 Fujimi is an independent slurry manufacturer with over 30 years of experience producing plastic lens polish for the European and Asian markets.  Fujimi is excited to announce that POLIPLA, a premium series of plastic lens slurries will be offered to the American markets.  Fujimi will launch POLIPLA at the International Vision Expo West trade show in Las Vegas on September 13, 2017. POLIPL...

Fujimi Presentation at 2017 CMPUG Spring Meeting

Posted May 11, 2017

Hooi-Sung (Brian) Kim, PhD at Fujimi Corporation presented a study titled, "The Impact of Sample Containers on Large Particle Count for CMP Slurries", at the 2017 CMPUG Spring Meeting. The presentation highlighted the contribution of sample bottle lid liners to increased LPC counts in CMP slurries. The presentation material can be downloaded here.

Presentation: Settling of Colloidal Silica Particles in CMP Slurry

Posted March 22, 2017

Fujimi Corporation's Senior Product Development Chemist, Dr. Jie Lin, presented a paper at China Semiconductor Technology International Conference, CSTIC 2017 (March 12-13 in Shanghai, China). The paper is titled "Settling of Colloidal Silica Particles in CMP Slurry: Monitoring, Effect, and Handling", co-authored by Jie Lin and W. Scott Rader.

Intel© 2016 SCQI Award

Posted March 9, 2017

Fujimi Corporation has been recognized by Intel as a 2016 Supplier Continuous Quality Improvement (SCQI) award winner. The SCQI award is Intel’s most distinguished supplier recognition, granted to an elite group of suppliers that has achieved the very highest standards of quality, cost, availability, technology, customer service, labor and ethics systems, and environmental sustainability. “On behalf of Intel, I congratulate Fujimi Corporation on their 2016 Supplier Continuous ...

Fujimi Presents EHS Friendly Slurries at 20th CAMP 2016

Posted August 25, 2016

The Fujimi group presented a study titled, "EHS Friendly Slurries with High Poly Si Removal Rate and Nearly Zero ILD Loss" at the 20th International Symposium on Chemical-Mechanical Planarization in August, 2016. The study was co-authored by Haiyan Li, Akira Endou, Annette Schaper, Todd Eck, Toshio Shinoda, and Anne Miller who represent a mix of researchers from Fujimi Corporation and Fujimi Incorporated.
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