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Fujimi Staff Present Paper at CAMP 2016




Posted August 23, 2016

Fujimi Corporation's Jimmy Granstrom and Hisashi Takeda presented a paper at the Twentieth International Symposium on Chemical-Mechanical Planarization, hosted by CAMP in Lake Placid, New York August 7-10 2016. The research paper, titled ">Copper Corrosion Suppression For Advanced Nodes In Ruthenium Barrier Chemical Mechanical Polishing", was presented on August 8.