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Fujimi Ruthenium Barrier Slurry presented at 17th Annual Symposium on Chemical-Mechanical Planarization




Posted November 26, 2012

In August 2012, Fujimi Research & Development personnel presented the company's current ruthenium barrier slurry development work at the 17th Annual Symposium on Chemical-Mechanical Planarization (CMP) in Lake Placid, NY.

Presentation attendess included CMP end users; university staff; and tool, pad and slurry manufacturers. The symposium is organized by the Center for Advanced Materials Processing (CAMP) at Clarkson University.