The Latest Fujimi News
Fujimi Recognized for Positive Energy Impact
Posted June 5, 2019
May 2019 Fujimi Corporation has been recognized by Portland General Electric (PGE) for making a positive impact in our community through participation in PGE's Energy Partner Program. Through Fujimi's shifting of energy load during peak consumption times, we were able to contribute to a total of 13.5 Megawatt in electrical savings achieved by this program. Official Notice PDF For additional information on this program, please see PGE's website at http://portlandgeneral...
Fujimi Corporation Receives Intel's Preferred Quality Supplier (PQS) Award
Posted March 11, 2019
Tualatin, OR, March 7, 2019 – Fujimi Corporation has been recognized by Intel as a recipient of a 2018 Preferred Quality Supplier (PQS) award. The PQS award recognizes companies like Fujimi Corporation that Intel believes have relentlessly pursued excellence and conducted business with resolute professionalism. “Intel’s award winning suppliers are critical to Intel’s success,” said Jacklyn Sturm, corporate vice president and general manager of Global Supply ...
Doctor Shinya Hirano to Head the Fujimi SiC Center for Excellence
Posted February 13, 2019
Fujimi is a recognized leader in CMP polishing slurries and lapping solutions to the semiconductor market. Today, Fujimi would like to announce the arrival of Dr. Shinya Hirano, Product Development Scientist, to head the Fujimi Center of Excellence for SiC wafer polishing at Fujimi Corporation in March 2019. Hirano-san received his PhD at the Graduate University for Advanced Studies, Department of Structural Molecular Science in Okazaki, Japan. He has over 10 years of CMP process development ...
High Volume Manufacturing (HVM) for SiC Wafer Polishing Slurries in the US
Posted February 13, 2019
Fujimi is a recognized leader in CMP polishing slurries and lapping solutions to the semiconductor market. Today, Fujimi would like to announce that we have established a HVM site for silicon carbide (SiC) wafer polishing slurries at our Tualatin, Oregon, USA facility. Leveraging our cumulative knowledge in research and development and expertise in precision manufacturing, Fujimi is enabling our customers to meet the challenges of polishing SiC substrate, which is extremely hard and brittle m...
Fujimi Incorporated and Cabot Microelectronics Corporation Announce Collaboration for Advanced Slurry Development
Posted March 28, 2018
Kiyosu, Aichi, March 29, 2018 – Fujimi Incorporated (TSE: 5384), a pioneer in the field of manufacturing synthetic precision abrasives as well as a leading supplier of silicon wafer lapping abrasives and polishing slurries, and Cabot Microelectronics Corporation (Nasdaq: CCMP), the world’s leading supplier of chemical mechanical planarization (CMP) polishing slurries and the second largest CMP pads supplier to the semiconductor industry today announced plans to...