Newly Redesigned Website at http://35.90.24.10 Fujimi Corporation is excited to announce the release of our newly re-designed corporate website. Through collaborative design and development between Fujimi Corporation and Portland based Media Mechanic, our new site represents Fujimi Corporation’s dedication to our customers, our products, and our quality. We have significantly re-designed our site to make it a […]
In August 2012, Fujimi Research & Development personnel presented the company’s current ruthenium barrier slurry development work at the 17th Annual Symposium on Chemical-Mechanical Planarization (CMP) in Lake Placid, NY. Presentation attendess included CMP end users; university staff; and tool, pad and slurry manufacturers. The symposium is organized by the Center for Advanced Materials Processing […]
Our Senior Product Development Chemist, Dr. Jie Lin, recently presented a paper at The International Conference on Planarization/CMP Technology, ICPT 2012 (October 15-17 in Grenoble, France). The paper is titled “Planarization efficiency of Cu Protrusion“, and is co-authored by Jie Lin and Charles Poutasse.ICPT is the annual high-level conference covering all aspects of Chemical-Mechanical Polishing (CMP). […]
Fujimi Corporation is the subject of the Made in the Mid-Willamette Valley feature published in the Salem Statesman Journal on November 6, 2011.
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