August 11, 2014 – Center for Advanced Materials Processing (CAMP) At the Nineteenth International Symposium on Chemical-Mechanical Planarization, hosted by CAMP in Albany, New York, Fujimi Corporation’s Product Development Chemist, Jimmy Granstrom, presented a report on Fujimi’s development work regarding “Removal Rate Enhancers For Silica-based Ru Barrier Slurry“.
In a special ceremony April 23, Clean Water Services (CWS) honored Fujimi Corporation with an Industrial Partners Pretreatment Award for achieving a perfect compliance record in 2013. The company’s diligence complements the efforts of the greater Washington County community to act as responsible stewards of the Tualatin River Watershed. Thirty-nine Washington County industries—from microchip manufacturers […]
Dr. Jie Lin of Research & Development, presented a poster at the 10th International Conference on Planarization/CMP Technology, ICPT 2013 (Oct. 30 to Nov. 1, 2013 in Hsinchu, Taiwan). Titled “Effect of Pad Hardness on Planarization Efficiency of Selected Features in Cu CMP”, it is co-authored by Jie Lin and Charles Poutasse. ICPT is the […]
Source: Clarkson University Press Release – 9/4/2013 More than 100 researchers from several high- technology companies, including Fujimi staff, suppliers and universities from the United States, Japan, Korea, China, Taiwan, Belgium, and Canada, gathered in Lake Placid, N.Y., in August for the 18th International Symposium on Chemical-Mechanical Planarization (CMP), sponsored by Clarkson University’s Center for Advanced […]
Fujimi Corporation scientist, Hooi-Sung (Brian) Kim made a presentation on the development of high and low selectivity slurry for Silicon Carbonitride at the CAMP 2013 meeting held in Lake Placid, NY, August 12th, 2013. The presentation highlighted both the development of the CMP slurry and the post-polish surface analysis on SiC(N) surfaces. The entire development […]
Samsung has announced that it has begun mass producing the industry’s first three-dimensional (3D) Vertical NAND (V-NAND) flash memory, which breaks through the current scaling limit for existing NAND flash technology. Achieving gains in performance and area ratio, the new 3D V-NAND will be used for a wide range of consumer electronics and enterprise applications, […]
by Ebrahim Elfadel via The National Inside even the smallest of gadgets, there are many tiny parts and components that must come together as a single, integrated system to execute the functions of the device.Electronic components have to be made compatible with optical or mechanical ones, various kinds of materials must bind together properly, operating […]
Fujimi Corporation is excited to announce the development of a new series of plastic lens polishing slurries. The DPL 1200 series is comprised of compound slurries developed specifically for polishing CR-39 and polycarbonate lenses. This series of slurries is formulated with a highly pure alumina particle with a unique suspension formulation, delivering superior surface quality […]
Fujimi Corporation is excited to announce the development of a new series of highly pure silane coated alumina particles for the laminated flooring market. The particles are intended to be added to your resin or melamine formulation for use as a wear resistant layer. We have a variety of silane coated alumina powders to meet […]
Fujimi Corporation, through our participation in the Shred-itTM shredding and recycling program, saved 41.9 trees from destruction in 2012 through our shredding and recycling of approximately 2.3 tons of paper. The Shred-itTM program ensures that all material shredded from our location is baled and recycled. Based on industry estimates, every ton of recycled paper: See the full Certificate […]
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